椭圆光度法
2007-1
John Wiley & Sons Inc
Fujiwara, Hiroyuki
369
Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.
ForewordPrefaceAcknowledgments1 Introduction to Spectroscopic Ellipsometry 1.1 Features of Spectroscopic Ellipsometry 1.2 Applications of Spectroscopic Ellipsometry 1.3 Data Analysis 1.4 History of Development 1.5 Future Prospects References2 Principles of Optics 2.1 Propagation of Light 2.2 Dielectrics 2.3 Reflection and Transmission of Light 2.4 Optical Interference References3 Polarization of Light 3.1 Representation of Polarized Light 3.2 Optical Elements 3.3 Jones Matrix 3.4 Stokes Parameters References4 Principles of Spectroscopic Ellipsometry 4.1 Principles of Ellipsometry Measurement 4.2 Ellipsometry Measurement 4.3 Instrumentation for Ellipsometry 4.4 Precision and Error of Measurement References5 Data Analysis6 Ellipsometry of Anisotropic Materials7 Data Analysis Examples8 Real-Time Monitoring by Spectroscopic EllipsometryAppendices 1 Trigonometric Functions 2 Definitions of Optical Constants 3 Maxwell’s Equations for Conductors 4 Jones–Mueller Matrix Conversion 5 Kramers–Kronig RelationsIndex
