纳米结构的薄膜和涂层
2011-9
科学出版社
张萨姆
410
本书着重讨论了薄膜的功能特性(例如，光学、电子、电学特性等)，同时介绍了相应的器件及应用。
本书首先介绍功能薄膜大尺度制作与加工的化学途径，纳米复合材料薄膜的制作与表征。其次讲解了低维纳米复合材料的制作及其应用，硅纳米晶的光学和光电子学特性。最后介绍了可控微/纳米结构薄膜和器件，微系统应用的薄膜形状记忆合金等内容。
本书内容十分全面，不仅包含适合新入门者的对于细节的解释，也包括适合专家的最新前沿研究进展及资料。书中涵盖宽广范围的机械及功能技术，包括其在清洁能源领域的应用，这有助于研究并便于专业人员对这一迅速发展的领域有全面的了解和把握。本书由(新加坡)张萨姆
(Sam Zhang)著，
前言
编者
贡献者
1 利用化学途径藉由纳米构筑实现功能薄膜的大尺度制作与加工
2 SiC纳米结构/纳米复合材料薄膜的制备和表征
3 低维纳米复合材料的制备和应用
4 嵌入Si02基体中的硅纳米晶的光学和光电子学特性
5 嵌入非晶态Si02薄膜中的硅纳米晶的电学性能
6 溶胶凝胶法得到的纳米结构薄膜的性质和应用：光学领域
7 可控微/纳米结构薄膜和器件
8 微系统应用的薄膜形状记忆合金
索引
Top-down approaches consist of either using macroscopic tools to directly "write" materials on a substrate， or using macroscopic tools to transfer a computer-generated pattern onto the thin film material， and then "sculpting" a nanostructure by physically removing material （e.g.， by etching techniques）. It should be noted that either the solution/material to be used in the printing techniques， or the films to be "sculpted" may be prepared via sol-gel. The former case includes scanning tunneling microscopy （STM）， scanning probe lithography （SPL）， nanoimprint lithography （NIL）， and microcontact printing uCP）. STM allows the position of individual atoms to pattern structures with subnanometer precision， and SPL leads to features as small as 15 nm. uCP allows conformal contact between the stamp and the substrate for a range of topologies， including curved substrates/inner surfaces， due to the mechanical flexibility of the rubbery stamp. The imprinting device used in the NIL approach can be reused numerous times， leading to cost-effective， sub-100nm lithographic replication; however， the initial fabrication of the ultrahigh-resolution master molds remains very difficult to attain. It should be noted that these techniques， which allow the patterning of structures with nanometer precision， are neither cost- nor time-effective.62 The most common techniques used in the latter case （"sculpting" a nanostructure） are based on photolithography， which is unfortunately limited by optical diffraction effects to 200-500nm， and nanolitography （electron- and ion-based methods）， which already allow the preparation of ordered nanostructured arrays with high resolution， but have low throughput， since they consist of a lineby-line pattern. ……
《材料科学与应用进展·纳米结构的薄膜和涂层：功能特性（导读版）》涵盖了薄膜及涂层技术领域最新的研究进展及其功能性能方面的应用。 各章的作者均为各自研究领域前沿的顶尖研究人员。 包含大量图片、表格等，便于读者理解相关内容。 适合复合材料、化学化工、环境等领域的师生、科研人员阅读参考。
帮朋友买的，他说挺不错的，就是全英文的，读起来速度慢